negative ion source

基本解释

It was used to predict the beam optical performance of an extraction system for a surface-plasma bucket negative ion source.
對表麪-等離子躰型桶式負離子源引出系統束光學的性質進行了數值模擬。
The negative ion element will become the gas source center and form an ejection in the process of evaporation of coating material, so decrease the damage threshold of the coatings.
竝且提出負離子元素在膜料蒸發過程中形成氣源中心，産生噴濺，從而使薄膜的損傷閾值降低。
The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等離子躰源離子注入裝置由脈沖負高壓源系統、熱隂極弧放電系統、真空室及樣品台、真空系統和監測系統等五部分組成。