deep uv

基本解释

The photo-oxidation reaction of poly (styrene-sulfone)-a novel positive deep UV photoresist including film and solution has been studied by fluorescence spectra.
利用荧光光谱研究了聚苯乙烯砜正性远紫外抗蚀剂薄膜和溶液的光氧化反应。
Therefore, such factors having effect on the precision of deep UV lithography as diffraction effect, exposure dosage, wavelength and distribution of fly's eyes lens etc.
同时由于紫外光的衍射效应，获得高精度的大高宽比结构并不容易。本文深入研究了影响紫外深度光刻图形转移精度的如下因素；
Coherent light sources in the deep and vacuum UV (DUV and VUV) spectral regions become more important with the development of photolithography, laser micro-machining as well as laser spectroscopy.
随着光刻、激光微加工以及激光光谱仪的发展，紫外与深紫外光谱区的相干光源变得越来越重要。

If this (topdown) manufacturing process is to be based on the most modern forms of deposition (including epitaxy), e-beam or ultra-deep UV lithography and precision etching, the mainstay of microelectronics and optoelectronics fabrication, then there are strict limits described below for which one-off fabrication is possible, but manufacture is not.
FORBES: Are There Physical Limits to Nanotechnology?