optical photolithography

基本解释

• [物理学]光学光刻

英汉例句

双语例句

• At the present time, micro optical elements with continuous relief structure are usually fabricated by the multi-mask photolithography.
  目前一般采用多个二元掩模多次套刻的方法来制作连续微浮雕结构，用量化的台阶去逼近理想的轮廓。
• It goes with the tide of miniaturizing and integrating in optical devices. It has wide prospects for application in photolithography, fiber communication and optical information processing etc.
  它顺应了光学元件微小化和阵列化的趋势，在光刻、光纤通信、光学信息处理等领域有着广阔的应用前景。

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词组短语

短语

• photolithography in optical near field 近场光刻蚀

• optical photolithography更多词组

专业释义

物理学

• 光学光刻